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Precision molding for LGP, display & hologram / Mask Preparation

SVG Optronics is the world -wide leader in the precision molding of light guide plates for hot-embossing technology, photomask, and the origination of holographic and micro-structure pattern masters from small sizes to large format, from 2D/3D to 3D, from micro-texts to Fresnel lens, almost types of masters can be fabricated with the latest technologies.
 
 
 
The key facilities in the mastering process, such as laser lithography systems, laser direct writing systems, laser engraving machines, have been self-established to form the complete production lines for customized origination masters. The capacity of manufacturing masters is adopted ISO 

9001: 2000 Certification. 
 
Please to see the HoloMakerIIIc, the HoloMakerIIIb, the HoloScanV, iGrapher200-800 and the Microlab100.
 
The advanced manufacturing & testing facilities allow for fast and effective R&D, and provide customers not only cost-effective products but also complete solutions.
 
The leading fabrication facilities make the high quality  molds and masters in the short period that is very important for the customer’s marketing. The origination of press-molds has the high industrial standard for mass-production.
     

work flow: ask -- answer -- customer provide the design and requirements of printing -- files -- SVG designs the patterns with technology support solution -- asking customer’s opinions -- revising -- sampling -- asking -- modifying the design -- sampling again -- settling 
 
Technology flow: design - which technologies applied - molding and mastering according to the design - make the evolution of the technique solution and optical effects - modifying the design and technologies -- mastering again - finishing
 

SVG Optronics has established the complete production lines for customized optical and holographic  masters with own patents. The capacity of manufacturing  is more than 12 pieces of maters and adopted ISO 9001: 2000 Certification.  
 
 
 

Specifications 
Format : up to 1300mm x 1000mm 
 
Pitch of grating: 300nm - 400nm, 400nm - 100um
Resolution of images: 100 dpi – 1270dpi up to 254,000dpi 
 
Material: Nickel 
Patterns: up to  800mm x 610mm 
 
Type refers to mastering patterns: 3D images, micro-patterns, hololens, Fresnel lens,sub-wavelength optical images, sub-wavelngth hidden watermarks, ....
Feature customized:  hidden images, micro-text, enycryption patterns 
 
 
 

Types of image 2D/3D, 3D, true color, silvering, kinetic effects refers to terms of hologram types. 
 
Design requirement 
file *.cdr,*.ai, *.dxf, *.pds 
software AutoCAD, CorelDraw 
 
 
 
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Technical documentation download

High quality masks for MEMS and Flexible Curcuits

 

※ 0.22um resolution, 

 

 

※laser direct writing system, 

 

※graphics linewidth 1um photomask

 

※substrate size 4 "- 8"; 

 

※substrate materlas: glass, quartz, Si

 

※graphics file: GDSII,DXF

 

 

 

Larse Size Photomarks for OGS, Flexible curcuits

 

 

 

※0.5um resolution, 

 

※maskless UV laser patterning system, 

 

※substrate size: 8 "-32". 

 

※substrate materlas: glass, quartz, Si

 

※graphics file: GDSII,DXF

 

 

 

Holow Mask

 

 

※The hollow mask: graphics resolution 1u, hollow opening >40um, thickness 50um, substrate Ni. The purposes: OLED organic vapor deposition, the microelectrode 

hollow mask plate, the solar battery halftone: 50um line-width halftone.

※Contact mask exposure line-width  is over 3 micron due to the proximity, when the need to less than 3 micron production, maskless direct write is necessary. When direct writing 200nm-1 structure,  nanolithography is necessary.

 

 

 

Nano-Patterning Masters for HB-LED

 

 

 

 

SVG Optronics has made the micron-nano photonic crystal  direct-writing system NanoCrystal-8 which can write the periodic structures from 300nm to 3um, lattice or honeycomb. 

 

 

Nano-patterning is important technology for LED / OLED substrate manufacturing, diffraction spectroscopic devices.

 

NanoCrystal-8 has a high-speed patterning feature, for example, one 2-inch substrate, writing the 450nm periodic structure, just two minutes.

 

 

 

 

 

For more detailed information, please to contact Dr.PU: [email protected] 

 

 

 

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Technical documentation download

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